Hans Pfeiffer
From Wikipedia, the free encyclopedia
Hans-Christian Pfeiffer (January 7, 1937 - November 15, 2022) was a German physicist best known for his contribution to the development of electron beam lithography. He is the original inventor of variable-shaped beam (VSB) electron-beam projection system[1][2] while at IBM. He remained active in the mask making community through consulting after retirement, most notably with VISTEC, a electron beam projection company based in Jena, Germany. He continued to be active in the mask making community most notably the annual BACUS conference, most recently as SPIE PUV Symposium in Monterey, California in the fall.
