John Vig
From Wikipedia, the free encyclopedia
Born31 May 1942
Budapest, Hungary
EducationB.S., M.S., Ph.D.
AlmamaterThe City College of New York, B.S.; Rutgers, The State University of New Jersey, Ph.D.
OccupationPhysicist
John R. Vig | |
|---|---|
Vig János | |
| Born | 31 May 1942 Budapest, Hungary |
| Education | B.S., M.S., Ph.D. |
| Alma mater | The City College of New York, B.S.; Rutgers, The State University of New Jersey, Ph.D. |
| Occupation | Physicist |
| Known for | UV-ozone cleaning, Chemical polishing of quartz surfaces, Polyimide bonding of resonators, Noise in MEMS, Tutorial on quartz resonators[1] |
| Relatives | Miklos Vig |
| Awards | 2020 IEEE Richard M. Emberson Award, 2006 C.B. Sawyer Memorial Award, 1990 IEEE UFFC Cady Award[2] |
| Scientific career | |
| Fields | Physics |
| Institutions | U.S. Army Research Lab, Fort Monmouth, New Jersey, U.S. |
| Thesis | The Kondo effect in some dilute magnetic alloys of zinc (1969) |
| Doctoral advisor | Prof. Bernard Serin |
John Vig (born 31 May 1942) is a physicist, executive and inventor. His career has been with the U.S. Army Research Lab and he has also been active with the IEEE. He is known for his inventions in UV-ozone cleaning, chemical polishing of quartz surfaces, polyimide bonding of resonators and noise in MEMS.[3]
