Tris(trimethylsilyl)amine
From Wikipedia, the free encyclopedia
| Names | |
|---|---|
| Preferred IUPAC name
1,1,1-Trimethyl-N,N-bis(trimethylsilyl)silanamine | |
| Identifiers | |
3D model (JSmol) |
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| ChemSpider | |
| ECHA InfoCard | 100.014.951 |
| EC Number |
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PubChem CID |
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| UNII | |
CompTox Dashboard (EPA) |
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| Properties | |
| C9H27NSi3 | |
| Molar mass | 233.57g/mol |
| Appearance | Waxy solid |
| Melting point | 67–69°C |
| Boiling point | 215°C (85°C at 13mmHg) |
| Solubility | Nonpolar organic solvents |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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Tris(trimethylsilyl)amine is the simplest tris(trialkylsilyl)amine which are having the general formula (R3Si)3N, in which all three hydrogen atoms of the ammonia are replaced by trimethylsilyl groups (-Si(CH3)3).[1] Tris(trimethylsilyl)amine has been for years in the center of scientific interest as a stable intermediate in chemical nitrogen fixation (i. e. the conversion of atmospheric nitrogen N2 into organic substrates under normal conditions).[2][3][4]
Early attempts to prepare tris(trimethylsilyl)amine from ammonia and trimethylchlorosilane (TMS-Cl) were unsuccessful even at temperatures of 500 °C and in the presence of the base pyridine.[5][6] The reaction of ammonia and trimethylchlorosilane stops at the stage of the doubly silylated product bis(trimethylsilyl)amine (usually referred to as hexamethyldisilazane, HMDS).

Tris(trimethylsilyl)amine is obtained by reaction of the sodium salt of hexamethyldisilazane - from hexamethyldisilazane and sodium amide[7] or from hexamethyldisilazane, sodium and styrene[1] - with trimethylchlorosilane in 80% yield.[8]
- [(CH3)3Si]2NH + NaNH2 → NH3 + NaN[Si(CH3)3]2 ( + ClSi(CH3)3 ) → NaCl + N[Si(CH3)3]3
The lithium salt of hexamethyldisilazane - from hexamethyldisilazane and butyllithium[9] or from hexamethyldisilazane and phenyllithium[8] - reacts with trimethylchlorosilane only in yields of 50-60% to tris(trimethylsilyl)amine.
The reaction of lithium nitride with trimethylchlorosilane can be carried out as a one-pot reaction in THF with 72% yield.[10]
- Li3N + 3Me3SiCl → N(Me3Si)3 + 3LiCl



